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1

Towards Ecological Validity in Research into Input-based Practice: Form Spotting Can Be as Beneficial as Form-meaning Practice

Kasprowicz, Rowena, Marsden, Emma

Journal:

Applied Linguistics

Year:

2017

Language:

english

File:

PDF, 415 KB

english, 2017

2

Handbook of Integrative Dermatology || Disorders of Pigmentation

Lio, Peter A., Patel, Toral, Peters, Neill T., Kasprowicz, Sarah

Year:

2015

Language:

english

File:

PDF, 163 KB

english, 2015

3

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Automatic classification and defect verification based on inspection technology with lithography simulation

Hayashi, Naoya, Kasprowicz, Bryan S., Kato, Masaya, Inuzuka, Hideki, Kosuge, Takeshi, Yoshikawa, Shingo, Kanno, Kayoko, Imai, Hidemichi, Miyashita, Hiroyuki, Vacca, Anthony, Fiekowsky, Peter, Fiekowsk

Year:

2015

Language:

english

File:

PDF, 640 KB

english, 2015

4

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Process capability of etched multilayer EUV mask

Hayashi, Naoya, Kasprowicz, Bryan S., Takai, Kosuke, Iida nee Sakurai, Noriko, Kamo, Takashi, Morikawa, Yasutaka, Hayashi, Naoya

Year:

2015

Language:

english

File:

PDF, 2.20 MB

english, 2015

5

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Photomask etch system and process for 10nm technology node and beyond

Hayashi, Naoya, Kasprowicz, Bryan S., Chandrachood, Madhavi, Grimbergen, Michael, Yu, Keven, Leung, Toi, Tran, Jeffrey, Chen, Jeff, Bivens, Darin, Yalamanchili, Rao, Wistrom, Richard, Faure, Tom, Bart

Year:

2015

Language:

english

File:

PDF, 942 KB

english, 2015

6

Health related quality of life in patients with diabetic foot ulceration — translation and Polish adaptation of Diabetic Foot Ulcer Scale short form

Macioch, Tomasz, Sobol, Elżbieta, Krakowiecki, Arkadiusz, Mrozikiewicz-Rakowska, Beata, Kasprowicz, Monika, Hermanowski, Tomasz

Journal:

Health and Quality of Life Outcomes

Year:

2017

Language:

english

File:

PDF, 404 KB

english, 2017

7

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Reticle decision center: a novel applications platform for enhancing reticle yield and productivity at 10nm technology and beyond

Kasprowicz, Bryan S., Buck, Peter D., Hwa, George, Bugata, Raj, Chiang, Kaiming, Lakkapragada, Suresh, Tolani, Vikram, Gopalakrishnan, Sandhya, Chen, Chun-Jen, Yang, Chin-Ting, Hsu, Sheng-Chang, Tuo,

Year:

2016

Language:

english

File:

PDF, 691 KB

english, 2016

8

The relationship of agonistic and affiliative behavior patterns to cellular immune function among cynomolgus monkeys (Macaca fascicularis) living in unstable social groups

Jay R. Kaplan, Eugene R. Heise, Stephen B. Manuck, Carol A. Shively, Sheldon Cohen, Bruce S. Rabin, Alfred L. Kasprowicz

Journal:

American Journal of Primatology

Year:

1991

Language:

english

File:

PDF, 1.08 MB

english, 1991

9

1857 and the fear of Muslim rebellion on India's North‐West Frontier

Kasprowicz, Michael D.

Journal:

Small Wars & Insurgencies

Year:

1997

Language:

english

File:

PDF, 826 KB

english, 1997

10

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Advanced repair solution of clear defects on HTPSM by using nanomachining tool

Hayashi, Naoya, Kasprowicz, Bryan S., Lee, Hyemi, Kim, Munsik, Jung, Hoyong, Kim, Sangpyo, Yim, Donggyu

Year:

2015

Language:

english

File:

PDF, 627 KB

english, 2015

11

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Higher order feed-forward control of reticle writing error fingerprints

Hayashi, Naoya, Kasprowicz, Bryan S., van Haren, Richard, Cekli, Hakki Ergun, Beltman, Jan, Pastol, Anne, Sundermann, Frank, Gatefait, Maxime

Year:

2015

Language:

english

File:

PDF, 1.04 MB

english, 2015

12

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - From nightmares to sweet dreams: inspection of aggressive OPC on 14nm reticles (and beyond) using a novel high-NA and low-NA dual method

Hayashi, Naoya, Kasprowicz, Bryan S., Badger, Karen D., Hibbs, Michael, Seki, Kazunori, Broadbent, William, Hutchinson, Trent, Redding, Vincent

Year:

2015

Language:

english

File:

PDF, 1.60 MB

english, 2015

13

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - NXE pellicle: development update

Kasprowicz, Bryan S., Buck, Peter D., Brouns, Derk, Bendiksen, Aage, Broman, Par, Casimiri, Eric, Colsters, Paul, De Graaf, Dennis, Harrold, Hilary, Hennus, Piet, Janssen, Paul, Kramer, Ronald, Kruizi

Year:

2016

Language:

english

File:

PDF, 1.76 MB

english, 2016

14

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Suppressing rippling with minimized corner rounding through OPC fragmentation optimization

Kasprowicz, Bryan S., Buck, Peter D., Wang, Jingyu, Wei, Alexander, Wilkinson, William, Chen, Norman

Year:

2016

Language:

english

File:

PDF, 439 KB

english, 2016

15

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Electron beam mask writer EBM-9500 for logic 7nm node generation

Kasprowicz, Bryan S., Buck, Peter D., Matsui, Hideki, Kamikubo, Takashi, Nakahashi, Satoshi, Nomura, Haruyuki, Nakayamada, Noriaki, Suganuma, Mizuna, Kato, Yasuo, Yashima, Jun, Katsap, Victor, Saito,

Year:

2016

Language:

english

File:

PDF, 1.03 MB

english, 2016

16

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Comparing curvilinear vs Manhattan ILT shape efficacy on EPE and process window

Kasprowicz, Bryan S., Buck, Peter D., Zhang, Dan, Buck, Peter, Tritchkov, Alexander, Madhusudhan, Saikiran, Word, James

Year:

2016

Language:

english

File:

PDF, 824 KB

english, 2016

17

SPIE Proceedings [SPIE 32nd European Mask and Lithography Conference - Dresden, Germany (Tuesday 21 June 2016)] 32nd European Mask and Lithography Conference - Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Behringer, Uwe F.W., Finders, Jo, Green, Michael, Ham, Young, Dillon, Brian, Kasprowicz, Bryan, Hur, Ik Boum, Park, Joong Hee, Choi, Yohan, McMurran, Jeff, Kamberian, Henry, Chalom, Daniel, Klikovits,

Year:

2016

Language:

english

File:

PDF, 734 KB

english, 2016

18

Foreign Language Educators’ Exposure to Research: Reported Experiences, Exposure Via Citations, and a Proposal for Action

MARSDEN, EMMA, KASPROWICZ, ROWENA

Journal:

The Modern Language Journal

Year:

2017

Language:

english

File:

PDF, 1.87 MB

english, 2017

19

Pet-To-Man Travelling Staphylococci || Diagnostics: Routine Identification on Standard and Chromogenic Media, and Advanced Automated Methods

Kasprowicz, Andrzej

Year:

2018

Language:

english

File:

PDF, 5.97 MB

english, 2018

20

Handbuch Virtualität || Virtuelle Produktivität

Kasprowicz, Dawid, Rieger, Stefan

Year:

2019

Language:

german

File:

PDF, 348 KB

german, 2019

21

Handbuch Virtualität || Virtual Embodiment

Kasprowicz, Dawid, Rieger, Stefan

Year:

2019

Language:

german

File:

PDF, 237 KB

german, 2019

22

Handbuch Virtualität || Digitales Geld und virtuelles Geld

Kasprowicz, Dawid, Rieger, Stefan

Year:

2018

Language:

german

File:

PDF, 211 KB

german, 2018

23

The relationship between the time of cerebral desaturation episodes and outcome in aneurysmal subarachnoid haemorrhage: a preliminary study

Burzyńska, Małgorzata, Uryga, Agnieszka, Kasprowicz, Magdalena, Czosnyka, Marek, Dragan, Barbara, Kübler, Andrzej

Journal:

Journal of Clinical Monitoring and Computing

Year:

2019

Language:

english

File:

PDF, 1.27 MB

english, 2019

24

Improvement of integrated circuit testing reliability by using the defect based approach

Dominik Kasprowicz, Witold A. Pleskacz

Journal:

Microelectronics Reliability

Year:

2003

Language:

english

File:

PDF, 244 KB

english, 2003

25

Transcranial Doppler Pulsatility Index: What it is and What it Isn’t

Nicolás de Riva, Karol P. Budohoski, Peter Smielewski, Magdalena Kasprowicz, Christian Zweifel, Luzius A. Steiner, Matthias Reinhard, Neus Fábregas, John D. Pickard, Marek Czosnyka

Journal:

Neurocritical Care

Year:

2012

Language:

english

File:

PDF, 599 KB

english, 2012

26

Improved Noninvasive Intracranial Pressure Assessment With Nonlinear Kernel Regression

Peng Xu, Kasprowicz, M., Bergsneider, M., Xiao Hu

Journal:

IEEE Transactions on Information Technology in Biomedicine

Year:

2010

Language:

english

File:

PDF, 672 KB

english, 2010

27

Effect of salts and organic acids on metabolite production and microbial parameters of piglets' digestive tract

M. Kasprowicz-Potocka, A. Frankiewicz, M. Selwet, K. Chilomer

Journal:

Livestock Science

Year:

2009

Language:

english

File:

PDF, 102 KB

english, 2009

28

[IEEE 2009 IEEE International Symposium on Circuits and Systems - ISCAS 2009 - Taipei, Taiwan (2009.05.24-2009.05.27)] 2009 IEEE International Symposium on Circuits and Systems - Adder circuits with transistors using independently controlled gates

Weis, Marcus, Pfitzner, Andrzej, Kasprowicz, Dominik, Emling, Rainer, Maly, Wojciech, Schmitt-Landsiedel, Doris

Year:

2009

Language:

english

File:

PDF, 1.10 MB

english, 2009

29

Diffusion of rubidium atoms in PDMS thin films

Journal:

Chemical Physics Letters

Year:

2004

Language:

english

File:

PDF, 367 KB

english, 2004

30

Effect of a Single Bout of Resistance Exercise on Arterial Stiffness Following a High-Fat Meal

Augustine, J., Tarzia, B., Kasprowicz, A., Heffernan, K.

Journal:

International Journal of Sports Medicine

Year:

2014

Language:

english

File:

PDF, 253 KB

english, 2014

31

Some Polish Lyrics

Maurice A. Michael, C. K. Norwid, Jan Kasprowicz, Luejan Rydel, Kazimierz Tetmajer and Stanislaw Korab-Brzozowski

Journal:

American Slavic and East European Review

Year:

1947

File:

PDF, 217 KB

1947

32

VALIDATION OF A SIMPLE METHOD OF ASSESSING CARDIAC PREEJECTION PERIOD: A POTENTIAL INDEX OF SYMPATHETIC NERVOUS SYSTEM ACTIVITY

LARKIN, KEVIN T., KASPROWICZ, ALFRED L.

Journal:

Perceptual and Motor Skills

Year:

1986

File:

PDF, 305 KB

1986

33

Some Polish Lyrics

Maurice A. Michael, C. K. Norwid, Jan Kasprowicz, Luejan Rydel, Kazimierz Tetmajer and Stanislaw Korab-Brzozowski

Journal:

American Slavic and East European Review

Year:

1947

Language:

english

File:

PDF, 217 KB

english, 1947

34

VALIDATION OF A SIMPLE METHOD OF ASSESSING CARDIAC PREEJECTION PERIOD: A POTENTIAL INDEX OF SYMPATHETIC NERVOUS SYSTEM ACTIVITY

LARKIN, KEVIN T., KASPROWICZ, ALFRED L.

Journal:

Perceptual and Motor Skills

Year:

1986

Language:

english

File:

PDF, 305 KB

english, 1986

35

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - ILP-based co-optimization of cut mask layout, dummy fill, and timing for sub-14nm BEOL technology

Hayashi, Naoya, Kasprowicz, Bryan S., Han, Kwangsoo, Kahng, Andrew B., Lee, Hyein, Wang, Lutong

Year:

2015

Language:

english

File:

PDF, 764 KB

english, 2015

36

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Front Matter: Volume 9635

Hayashi, Naoya, Kasprowicz, Bryan S., SPIE, Proceedings of

Year:

2015

Language:

english

File:

PDF, 412 KB

english, 2015

37

Shawn, the Drosophila Homolog of SLC25A39/40, Is a Mitochondrial Carrier That Promotes Neuronal Survival

Slabbaert, J. R., Kuenen, S., Swerts, J., Maes, I., Uytterhoeven, V., Kasprowicz, J., Fernandes, A. C., Blust, R., Verstreken, P.

Journal:

Journal of Neuroscience

Year:

2016

Language:

english

File:

PDF, 6.32 MB

english, 2016

38

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - In die mask overlay control for 14nm double-patterning lithography

Hayashi, Naoya, Kasprowicz, Bryan S., Chou, William, Cheng, James, Tseng, Alex C. P., Wu, J. K., Chang, Chin Kuei, Cheng, Jeffrey, Lee, Adder, Huang, Chain Ting, Peng, N. T., Hsu, Simon C. C., Yu, Chu

Year:

2015

Language:

english

File:

PDF, 701 KB

english, 2015

39

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Accurate mask model implementation in OPC model for 14nm nodes and beyond

Hayashi, Naoya, Kasprowicz, Bryan S., Zine El Abidine, Nacer, Sundermann, Frank, Yesilada, Emek, Farys, Vincent, Huguennet, Frederic, Armeanu, Ana-Maria, Bork, Ingo, Chomat, Michael, Buck, Peter, Scha

Year:

2015

Language:

english

File:

PDF, 1.66 MB

english, 2015

40

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Reduction of in-lot overlay variation with integrated metrology, and a holistic control strategy

Hayashi, Naoya, Kasprowicz, Bryan S., Lee, Hong-Goo, Han, Sang-Jun, Ma, Won-Kwang, Kim, Young-Sik, Kwak, Noh-Jung, Böcker, Paul, Deckers, David, Kou, Weitian, Kupers, Michiel, Ryan, Kevin, McNamara, E

Year:

2015

Language:

english

File:

PDF, 2.14 MB

english, 2015

41

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography

Hayashi, Naoya, Kasprowicz, Bryan S., Chang, Shao-Wen, Wang, Tzu-Yi, Lien, Ta-Cheng, Chen, Chia-Jen, Lin, Chih-Cheng, Lee, Sin-Chang, Yen, Anthony

Year:

2015

Language:

english

File:

PDF, 350 KB

english, 2015

42

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Investigation of scum type growing defects on attenuated PSM and its prevention

Hayashi, Naoya, Kasprowicz, Bryan S., Choi, Jihwan, Kim, Yongho, Lee, Dongwook, Jung, Hoyong, Kim, Snagpyo, Yim, Donggyu

Year:

2015

Language:

english

File:

PDF, 559 KB

english, 2015

43

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Exploring the origin of charging-induced pattern positioning errors in mask making using e-beam lithography

Hayashi, Naoya, Kasprowicz, Bryan S., Chen, Chien-Cheng, Liu, Tzu-Ling, Chang, Shao-Wen, Ho, Yen-Cheng, Chen, Chia-Jen, Lin, Chih-Cheng, Lien, Ta-Cheng, Lee, Hsin-Chang, Yen, Anthony

Year:

2015

Language:

english

File:

PDF, 1015 KB

english, 2015

44

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Rule-based OPC and MPC interaction for implant layers

Hayashi, Naoya, Kasprowicz, Bryan S., Fu, Nan, Ning, Guoxiang, Werle, Florian, Roling, Stefan, Hecker, Sandra, Ackmann, Paul, Buergel, Christian

Year:

2015

Language:

english

File:

PDF, 691 KB

english, 2015

45

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Improvement in accuracy of defect size measurement by automatic defect classification

Hayashi, Naoya, Kasprowicz, Bryan S., Samir, Bhamidipati, Pereira, Mark, Paninjath, Sankaranarayanan, Jeon, Chan-Uk, Chung, Dong-Hoon, Yoon, Gi-Sung, Jung, Hong-Yul

Year:

2015

Language:

english

File:

PDF, 717 KB

english, 2015

46

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Characterization and mitigation of relative edge placement errors (rEPE) in full-chip computational lithography

Hayashi, Naoya, Kasprowicz, Bryan S., Sturtevant, John, Gupta, Rachit, Shang, Shumay, Liubich, Vlad, Word, James

Year:

2015

Language:

english

File:

PDF, 1.37 MB

english, 2015

47

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Ruthenium capping layer preservation for 100X clean through pH driven effects

Hayashi, Naoya, Kasprowicz, Bryan S., Dattilo, Davide, Dietze, Uwe, Hsu, Jyh-Wei

Year:

2015

Language:

english

File:

PDF, 1.94 MB

english, 2015

48

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

Hayashi, Naoya, Kasprowicz, Bryan S., Choi, Jaehyuck, Kim, Jinsu, Lowe, Jeff, Dattilo, Davide, Koh, Soowan, Choi, Jun Yeol, Dietze, Uwe, Shoki, Tsutomu, Kim, Byung Gook, Jeon, Chan-Uk

Year:

2015

Language:

english

File:

PDF, 1.85 MB

english, 2015

49

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - An efficient resolution enhancement technique flow for 65nm logic poly layer

van Adrichem, Paul J. M., Komuro, Masanori, Chacko, Manoj, Kasprowicz, Bryan S.

Year:

2005

Language:

english

File:

PDF, 90 KB

english, 2005

50

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - New photomask substrate for improved lithography performance

Kasprowicz, Bryan S., Priestley, Richard, Heslin, Michael R., Fladd, David R., Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 20.06 MB

english, 2002

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